포토리소그래피용 조성물 및 방법

Abstract

비침지뿐만 아니라 침지 리소그래피(lithography) 처리를 위해 포함하는 포토레지스트 조성물 위에 적용되는 오버코팅(overcoating)층 조성물.

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    Patent Citations (1)

      Publication numberPublication dateAssigneeTitle
      US-2005202340-A1September 15, 2005Houlihan Francis M., Dammel Ralph R., Romano Andrew R., Raj SakamuriProcess of imaging a deep ultraviolet photoresist with a top coating and materials thereof

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